Do Heon Kim

Title: Innovations Led by Do Heon Kim: A Focus on Supercritical Processing Technology

Introduction

Do Heon Kim, an accomplished inventor based in Cheonan-si, South Korea, has made significant contributions to the field of substrate treatment and processing technology. With a total of seven patents to his name, Kim continues to push the boundaries of innovation, particularly in the realm of supercritical fluid applications.

Latest Patents

Among his notable inventions, Kim's latest patents stand out for their technical sophistication and potential industrial applications.

1. **Apparatus for Treating Substrate**: This innovative apparatus is designed to enhance the drying efficiency of substrates through supercritical fluid technology. It features a process chamber with a treatment space, a support unit for substrates, a fluid supply unit for supercritical fluid, and a controller that regulates the fluid supply. The capability to selectively supply supercritical fluid at varying densities allows for improved substrate drying processes.

2. **Supercritical Processing Apparatus**: This apparatus comprises an upper vessel with a central fluid hole and a lower vessel that also has a central fluid hole. The defined space between the vessels accommodates substrate placement. Notably, the upper vessel includes a guiding portion that slopes downward toward its periphery from the fluid hole, further enhancing the processing capabilities and efficiency of substrate treatment.

Career Highlights

Kim is currently associated with Semes Co., Ltd., where he has been instrumental in driving research and innovation in supercritical processing technologies. His career reflects a commitment to enhancing industrial applications of substrate treatment through inventive solutions.

Collaborations

Throughout his career, Do Heon Kim has collaborated with talented coworkers, including Chan Young Heo and Kihoon Choi. Together, they share a vision for advancing technology and improving processes in their field of work.

Conclusion

Do Heon Kim remains a pivotal figure in the landscape of innovative technology within substrate treatment and supercritical processing. With his array of patents and collaborative efforts, he continues to inspire advancements that may redefine industrial applications and improve efficiencies in various sectors.