The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2024
Filed:
Jul. 22, 2020
Semes Co., Ltd., Chungcheongnam-do, KR;
Chan Young Heo, Gyeonggi-do, KR;
Kihoon Choi, Chungcheongnam-do, KR;
Ki-Moon Kang, Gyeonggi-do, KR;
Do Heon Kim, Gyeonggi-do, KR;
Jaeseong Lee, Gyeonggi-do, KR;
SEMES CO., LTD., Cheonan-si, KR;
Abstract
An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a fluid supply unit for supplying supercritical fluid to the treatment space, and a controller configured to control the fluid supply unit, wherein the fluid supply unit is configured to selectively supply the supercritical fluid at a first density or a second density higher than the first density into the treatment space. Thus, drying efficiency of the substrate when drying the substrate using the supercritical fluid may be improved.