The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2023
Filed:
Jul. 15, 2020
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Do Heon Kim, Hwaseong-si, KR;
Kihoon Choi, Cheonan-si, KR;
Chan Young Heo, Hwaseong-si, KR;
Ki-Moon Kang, Yongin-si, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 7/00 (2006.01); B08B 3/08 (2006.01); B08B 7/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02101 (2013.01); B08B 3/08 (2013.01); B08B 7/0021 (2013.01); B08B 7/0071 (2013.01); B08B 7/04 (2013.01);
Abstract
Disclosed is a method of treating a substrate. In one embodiment, supercritical fluid is supplied to a treatment space in a chamber such that the substrate in the treatment space is treated. The supercritical fluid is supplied to the treatment space while exhausting the treatment space. A temperature of the supercritical fluid supplied when exhausting the treatment space is higher than a temperature of the supercritical fluid supplied to the treatment space for treating the substrate.