The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Sep. 10, 2019
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Kihoon Choi, Cheonan-si, KR;
Chan Young Heo, Hwaseong-si, KR;
Do Heon Kim, Cheonan-si, KR;
Hae-Won Choi, Daejeon, KR;
Jaeseong Lee, Hwaseong-si, KR;
Anton Koriakin, Cheonan-si, KR;
Ji Soo Jeong, Seoul, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03D 3/00 (2006.01); G03F 7/16 (2006.01); B08B 3/04 (2006.01); G03F 7/32 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); B08B 3/04 (2013.01); G03F 7/3057 (2013.01); G03F 7/32 (2013.01);
Abstract
An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.