The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Mar. 11, 2022
Semes Co., Ltd., Cheonan-si, KR;
Hae-Won Choi, Daejeon, KR;
Anton Koriakin, Cheonan-si, KR;
Joon Ho Won, Suwon-si, KR;
Min Woo Kim, Seoul, KR;
Ki Hoon Choi, Cheonan-si, KR;
Eung Su Kim, Yongin-si, KR;
Tae Hee Kim, Yongin-si, KR;
Pil Kyun Heo, Yongin-si, KR;
Jang Jin Lee, Hwaseong-si, KR;
Jin Yeong Sung, Chungcheongbuk-do, KR;
Semes Co., Ltd., Cheonan-si, KR;
Abstract
The inventive concept provides a method for treating a substrate. The method for treating a substrate comprises: a pressurization step for increasing a pressure of an inner space of a chamber by supplying a treating fluid to the inner space, after taking the substrate into the inner space; a flow step for generating a flow of the treating fluid by combination of supplying and discharging the treating fluid to and from the inner space; and a depressurization step of decreasing the pressure of the inner space by discharging the treating fluid from the inner space, and wherein the pressurization step comprises: a bottom side supply process for increasing the pressure of the inner space by supplying the treating fluid to a backside of the substrate taken into the inner space; and a top side supply process of increasing the pressure of the inner space by supplying the treating fluid to a top side of the substrate taken into the inner space.