IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10915026 B1

PDFFull Text
Date of Patent:
Feb. 09, 2021

Filed:

Jun. 01, 2018

Substrate treating apparatus and substrate treating method

Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Hae-Won Choi, Daejeon, KR;

Kihoon Choi, Cheonan-si, KR;

Ki-Moon Kang, Yongin-si, KR;

Chan Young Heo, Hwaseong-si, KR;

Anton Koriakin, Cheonan-si, KR;

Jaeseong Lee, Cheonan-si, KR;

Assignee:

SEMES CO., LTD., Cheonan-si, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Kathleen Duda

Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/42 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); G03F 7/422 (2013.01); G03F 7/427 (2013.01); G03F 7/70491 (2013.01); H01L 21/0274 (2013.01); H01L 21/02101 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67173 (2013.01); H01L 21/67207 (2013.01); H01L 21/67225 (2013.01); H01L 21/67742 (2013.01);
Abstract

Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a first process chamber configured to supply a development liquid to a substrate that is carried into the first process chamber after an exposure process is performed on the substrate, a second process chamber configured to treat the substrate through a supercritical fluid, a feeding robot configured to transfer the substrate from the first process chamber to the second process chamber, and a controller configured to control the feeding robot such that the substrate is transferred to the second process chamber in a state in which the development liquid supplied by the first process chamber resides in the substrate.

Find Patent Forward Citations

Loading…