Anthony K Stamper

Williston, VT, United States of America

Anthony K Stamper

USPTO Granted Patents = 633 

 

 

Average Co-Inventor Count = 3.4

ph-index = 28

Forward Citations = 4,263(Granted Patents)

Forward Citations (Not Self Cited) = 3,332(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Willston, VT (US) (2005 - 2010)
  • Hopewell Junction, NY (US) (2012)
  • Essex Junction, VT (US) (2009 - 2019)
  • Williston, VT (US) (1998 - 2023)
  • Burlington, VT (US) (2016 - 2024)

Company Filing History:


Years Active: 1998-2025

Loading Chart...
Loading Chart...
Loading Chart...
Areas of Expertise:
Field Effect Transistors
Heterojunction Bipolar Transistors
Integrated Circuit Structures
Semiconductor On Insulator
Optofluidic Sensors
Thermally Conductive Interconnects
Photodetectors
Trench Isolation
Cavity Structures
Vertical Transistors
Electrical Isolation
Boolean Temperature Sensing
633 patents (USPTO):Explore Patents

Title: Anthony K Stamper - Pioneering Innovations in Semiconductor Technology

Introduction:

Anthony K Stamper, a renowned inventor and entrepreneur hailing from Williston, VT (US), has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 619 patents, Stamper has proven himself to be a trailblazer in his industry. This article delves into Stamper's latest patents, career highlights, notable collaborations, and his substantial impact on the field of invention and innovation.

Latest Patents:

Among Stamper's recent patents is the "Field Effect Transistor with Shallow Trench Isolation Features within Source/Drain Regions." This invention focuses on the fabrication of semiconductor structures, particularly field-effect transistors, employing isolation structures and gate structures with source/drain regions. This innovative approach enhances the performance and efficiency of these transistors, opening up possibilities for further advancements in semiconductor technology.

Additionally, Stamper is credited with the invention of "Dual Thickness Fuse Structures." This patent introduces a unique design for continuous wiring structures within semiconductors, incorporating a dual thickness feature. These structures, composed of conductive materials, enable more robust fuses and thicker wiring, leading to enhanced reliability and performance in semiconductor devices.

Career Highlights:

Stamper's illustrious career has been marked by remarkable achievements and associations with prominent industry players. He has worked extensively with International Business Machines Corporation (IBM), a global leader in the IT industry. Stamper's contributions to IBM's research and development have played a pivotal role in advancing the semiconductor field.

Furthermore, Stamper has collaborated with GlobalFoundries Inc., a semiconductor manufacturer catering to various industries worldwide. Through these partnerships, Stamper has left an indelible mark on the industry, bringing his expertise to the forefront of semiconductor innovation.

Collaborations:

Stamper has had the privilege of collaborating with industry luminaries, including Jeffrey P Gambino and Zhong-Xiang He. Gambino, a highly regarded engineer, has made significant contributions to the field of semiconductor technology. Stamper's collaboration with He, a skilled researcher and innovator, has further strengthened his influence in the industry. Together, they have fostered a culture of innovation and expertise in semiconductor development.

Conclusion:

Anthony K Stamper's creativity and inventiveness have propelled him to the forefront of the semiconductor industry. With an impressive patent portfolio and collaborations with industry giants like IBM and GlobalFoundries Inc., Stamper's contributions have revolutionized the field of semiconductor technology. His dedication to advancing the boundaries of invention and innovation continues to inspire countless others in the quest for technological progress.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…