The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Nov. 16, 2021
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Ramsey Hazbun, Colchester, VT (US);

Anthony Stamper, Burlington, VT (US);

Zhong-Xiang He, Essex Junction, VT (US);

Pernell Dongmo, Williston, VT (US);

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 62/85 (2025.01); H10D 30/01 (2025.01); H10D 30/47 (2025.01); H10D 62/824 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8503 (2025.01); H10D 30/015 (2025.01); H10D 62/824 (2025.01); H10D 64/411 (2025.01); H10D 64/512 (2025.01); H10D 64/513 (2025.01); H10D 30/47 (2025.01); H10D 30/475 (2025.01); H10D 30/478 (2025.01);
Abstract

A transistor structure is provided, the structure may be for a high electron mobility transistor (HEMT). The HEMT comprises a channel layer arranged over a substrate, the channel layer may have a top surface. A barrier layer may be arranged over the channel layer. A first opening may be in the barrier layer and extend partially into the channel layer. A first barrier liner may be arranged in the first opening and over the channel layer, the first barrier liner may have a bottom surface. The bottom surface of the first barrier liner may be lower than the top surface of the channel layer.


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