Akinori Kitamura

Title: Akinori Kitamura: Innovator in Etching Technology

Introduction

Akinori Kitamura is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of etching technology, holding a total of 18 patents. His innovative methods and apparatuses have advanced the capabilities of etching processes, particularly in semiconductor manufacturing.

Latest Patents

Among his latest patents is an etching method and apparatus that includes several steps: loading, first and second supplying, removing, and etching. In the loading step, a target object is placed into a chamber. The first supply step involves introducing a first gas containing carbon, hydrogen, and fluorine into the chamber. During the modification step, plasma of the first gas is generated to alter the surface of a mask film and an organic film that is not covered by the mask film. The second supply step introduces a second gas for etching the organic film. In the removal step, a modified layer on the organic film's surface is eliminated by applying a first high-frequency bias power. Finally, in the etching step, the organic film beneath the modified layer is etched using a second high-frequency bias power that is lower than the first.

Another notable patent is a method for etching a silicon layer and a plasma processing apparatus. This method involves removing an oxide film from a workpiece that includes a silicon layer and a mask. The process consists of forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine. This denatures the oxide film on the workpiece's surface. The denatured region is then removed by generating plasma of a rare gas, followed by etching the silicon layer using plasma of a second processing gas.

Career Highlights

Akinori Kitamura has worked with several esteemed organizations, including Tokyo Electron Limited and Japan Science and Technology Corporation. His experience in these companies has allowed him to refine his skills and contribute to groundbreaking advancements in etching technology.

Collaborations

Throughout his career, Kitamura has collaborated with notable colleagues such as Hiroto Ohtake and Masanobu Honda. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Akinori Kitamura's contributions to etching technology have significantly impacted the semiconductor industry. His innovative