The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Oct. 07, 2004
Tomoyo Yamaguchi, Nirasaki, JP;
Takashi Fuse, Nirasaki, JP;
Kiwamu Fujimoto, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Akiteru Koh, Nirasaki, JP;
Takashi Enomoto, Beverly, MA (US);
Hiroharu Ito, Nirasaki, JP;
Akinori Kitamura, Nirasaki, JP;
Tomoyo Yamaguchi, Nirasaki, JP;
Takashi Fuse, Nirasaki, JP;
Kiwamu Fujimoto, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Akiteru Koh, Nirasaki, JP;
Takashi Enomoto, Beverly, MA (US);
Hiroharu Ito, Nirasaki, JP;
Akinori Kitamura, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing method includes a step of preparing a process subject having an organic layer on a surface thereof, and a step of irradiating the process subject with Hplasma to improve plasma resistance of the organic layer.