Nirasaki, Japan

Tomoyo Yamaguchi


Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Goshogawara, JP (2006)
  • Nirasaki, JP (2008 - 2009)

Company Filing History:


Years Active: 2006-2009

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4 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Tomoyo Yamaguchi

Introduction

Tomoyo Yamaguchi is a prominent inventor based in Nirasaki, Japan, known for her contributions to the field of plasma processing and etching technologies. With a total of four patents to her name, she has made significant advancements that enhance the efficiency of semiconductor manufacturing processes.

Latest Patents

Her latest patents reflect her innovative approach to solving complex challenges in the industry. The first patent, titled "Method for etching an object to be processed," involves a process where an object features a structure consisting of an SiC film and an organic Si low-dielectric constant film. This method utilizes plasma generated from specific etching gases to etch the SiC film while employing the organic Si film as a protective mask. Another noteworthy patent is the "Plasma processing method," which describes a technique involving the irradiation of an organic layer on a surface with hydrogen plasma, thereby enhancing the plasma resistance of the organic layer and improving its durability.

Career Highlights

Yamaguchi currently works at Tokyo Electron Limited, a leading company in the semiconductor equipment sector. Her role has allowed her to push the boundaries of current technology, contributing valuable inventions that are essential for manufacturing advanced electronic components.

Collaborations

Throughout her career, Tomoyo has collaborated with talented individuals such as Takashi Fuse and Kiwamu Fujimoto. These partnerships foster a creative environment where innovative ideas can flourish, showcasing the importance of teamwork in driving technological advancements.

Conclusion

Tomoyo Yamaguchi's work exemplifies the impact of dedicated inventors in the ever-evolving field of semiconductor technology. Her latest patents not only address critical industry needs but also pave the way for future innovations in plasma processing and etching techniques. As she continues her journey, her contributions will undoubtedly influence the landscape of modern electronics for years to come.

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