Company Filing History:
Years Active: 2007-2009
Title: Akiteru Koh: Innovator in Plasma Processing Technologies
Introduction
Akiteru Koh is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 4 patents. His innovative work has advanced the capabilities of semiconductor manufacturing, particularly in the etching processes.
Latest Patents
One of his latest patents is a plasma processing method that includes a step of preparing a process subject with an organic layer on its surface. This method involves irradiating the process subject with Hplasma to enhance the plasma resistance of the organic layer. Another notable patent is a dry etching method, where a tungsten silicide layer is etched using plasma etching with Cl+O gas as the etching gas. The process concludes with over etching performed by plasma etching, ensuring a uniform residual quantity of the polysilicon layer beneath the tungsten silicide layer. This innovation allows for the stable fabrication of high-quality semiconductor devices.
Career Highlights
Akiteru Koh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this organization has positioned him as a key player in advancing plasma processing technologies.
Collaborations
He has collaborated with notable coworkers, including Takashi Enomoto and Akitaka Shimizu, contributing to various projects that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Conclusion
Akiteru Koh's contributions to plasma processing methods and dry etching techniques have significantly impacted the semiconductor industry. His innovative patents and collaborations continue to drive advancements in technology.