The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Jul. 05, 2002
Applicants:
Akitaka Shimizu, Nirasaki, JP;
Takashi Tsuruta, Nirasaki, JP;
Takashi Enomoto, Nirasaki, JP;
Hiromi Oka, Nirasaki, JP;
Akiteru Koh, Nirasaki, JP;
Inventors:
Akitaka Shimizu, Nirasaki, JP;
Takashi Tsuruta, Nirasaki, JP;
Takashi Enomoto, Nirasaki, JP;
Hiromi Oka, Nirasaki, JP;
Akiteru Koh, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A dry etching method involves plasma etching an organic anti-reflecting coating film through a mask layer made of photoresist and having a predetermined pattern by using an etching gas of CFand O. The method allows an organic anti-reflecting coating film to be etched such that the etched film exhibits a side wall portion having a better shape as compared with that formed by a conventional technique.