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For the Inventor, By the Inventor

Nirasaki, Japan

Akitaka Shimizu

This inventor holds 39 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in Substrate Processing. Top assignees: Tokyo Electron Limited, Iwatani Corporation. Active years: 2007-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akitaka Shimizu. Retrieved from https://idiyas.com/inventor/akitaka-shimizu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 39 

% Patents Active = 76.9


Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 116(Granted Patents)


Location History:

  • Miyagi, JP (2015 - 2021)
  • Yamanashi, JP (2008 - 2022)
  • Nirasaki, JP (2007 - 2023)

Company Filing History:

goldMedal39 out of 10,883 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 33 
 
Iwatani Corporation
 patents
where one patent can have more than one assignee

Years Active: 2007-2026

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Areas of Expertise:
Etching Method
Plasma Processing
Substrate Processing
Nanowire Transistor
Oxide Film Removal
Cleaning Apparatus
Deposition Process
Dry Etching
Fine Pattern Formation
Chemical Processes
Gas Based Etching
Device Manufacturing
39 patents (USPTO):Explore Patents
1. 12628586 - Etching method including steps of an oxidation process, a gas based chemical process, and removal of chemical products (2026-05-12),
2. 12500091 - Etching method, method of removing etching residue, and storage medium (2025-12-16),
3. 12237173 - Substrate processing method, substrate processing apparatus and substrate processing system (2025-02-25),
4. 12165848 - Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor (2024-12-10),
5. 11557486 - Etching method, damage layer removal method, and storage medium (2023-01-17),
6. 11443952 - Etching method and etching device (2022-09-13),
7. 11328904 - Substrate processing apparatus (2022-05-10),
8. 11024514 - Etching method and etching apparatus (2021-06-01),
9. 10985029 - Substrate processing apparatus and substrate processing method (2021-04-20),
10. 10975468 - Method of cleaning plasma processing apparatus (2021-04-13),
11. 10923358 - Substrate processing method (2021-02-16),
12. 10923329 - Substrate processing apparatus and substrate processing method (2021-02-16),
13. 10903083 - Substrate processing method, substrate processing apparatus and substrate processing system (2021-01-26),
14. 10734201 - Substrate processing apparatus (2020-08-04),
15. 10541145 - Substrate processing apparatus and substrate processing method (2020-01-21),

Title: Akitaka Shimizu: Pioneering Inventor from Nirasaki, Japan

Introduction: Akitaka Shimizu is a renowned inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to the field of innovation and technology.

Latest Patents: Akitaka Shimizu holds several patents in various technological domains, showcasing his continuous dedication to pushing the boundaries of invention and creativity.

Career Highlights: Throughout his illustrious career, Akitaka Shimizu has been instrumental in developing cutting-edge technologies that have revolutionized industries and improved the quality of life for many.

Collaborations: Akitaka Shimizu has collaborated with leading research institutions, universities, and innovative companies to further his inventions and bring them to fruition, solidifying his reputation as a visionary inventor.

Conclusion: Akitaka Shimizu's passion for innovation, coupled with his relentless drive to create, has cemented his legacy as a pioneering inventor not only in Nirasaki, Japan but on a global scale.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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