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For the Inventor, By the Inventor

Rensselaer, NY, United States of America

Takashi Enomoto

This inventor holds 9 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2007-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Enomoto. Retrieved from https://idiyas.com/inventor/takashi-enomoto-m376pcep

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9

% Patents Active = 66.7

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Nirasaki, JP (2007)
  • Beverly, MA (US) (2009)
  • Salem, MA (US) (2010)
  • Albany, NY (US) (2011 - 2012)
  • Rensselaer, NY (US) (2013)
  • Kurokawa-gun, JP (2020)
  • Miyagi, JP (2016 - 2021)

Company Filing History:

goldMedal9 out of 10,947 
 
Tokyo Electron Limited
 patents

Years Active: 2007-2021

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9 patents (USPTO):Explore Patents
1. 10950452 - Seasoning method and etching method (2021-03-16),
2. 10818502 - System and method of plasma discharge ignition to reduce surface particles (2020-10-27),
3. 9530626 - Method and apparatus for ESC charge control for wafer clamping (2016-12-27),
4. 8501628 - Differential metal gate etching process (2013-08-06),
5. 8218145 - Particle monitor system and substrate processing apparatus (2012-07-10),
6. 7969572 - Particle monitor system and substrate processing apparatus (2011-06-28),
7. 7743731 - Reduced contaminant gas injection system and method of using (2010-06-29),
8. 7473377 - Plasma processing method (2009-01-06),
9. 7179752 - Dry etching method (2007-02-20),

Title: Takashi Enomoto: Innovator in Plasma Processing Technologies

Introduction

Takashi Enomoto is a prominent inventor based in Rensselaer, NY (US). He has made significant contributions to the field of plasma processing, holding a total of 9 patents. His innovative work focuses on improving methods and systems that enhance the efficiency and effectiveness of plasma technology.

Latest Patents

Enomoto's latest patents include a seasoning method and an etching method. The seasoning method involves a first dry cleaning process that cleans the inside of a chamber by supplying an Ogas and generating plasma within the chamber. This is followed by a second dry cleaning process that seasons the chamber using a processing gas containing fluorine. This innovative approach significantly shortens the time required to return the chamber to its pre-maintenance state. Another notable patent is the system and method of plasma discharge ignition, which aims to reduce surface particles and decrease defects during plasma processing. This system utilizes a microelectronic workpiece positioned within a process chamber, employing multiple RF power sources and a DC power supply to maintain plasma effectively.

Career Highlights

Takashi Enomoto is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing plasma processing technologies, which are critical for the production of microelectronic devices.

Collaborations

Throughout his career, Enomoto has collaborated with notable colleagues, including Yoshio Ishikawa and Akiteru Koh. These collaborations have further enriched his research and development efforts in the field of plasma technology.

Conclusion

Takashi Enomoto's contributions to plasma processing technologies have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in microelectronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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