The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Mar. 30, 2006
Applicants:
Takashi Enomoto, Salem, MA (US);
Masaaki Hagihara, Peabody, MA (US);
Akiteru Ko, Peabody, MA (US);
Shinji Hamamoto, Salem, MA (US);
Masafumi Urakawa, Salem, MA (US);
Arthur H. Laflamme, Jr., Rowley, MA (US);
Edward Heller, Bedford, MA (US);
Inventors:
Takashi Enomoto, Salem, MA (US);
Masaaki Hagihara, Peabody, MA (US);
Akiteru Ko, Peabody, MA (US);
Shinji Hamamoto, Salem, MA (US);
Masafumi Urakawa, Salem, MA (US);
Arthur H. Laflamme, Jr., Rowley, MA (US);
Edward Heller, Bedford, MA (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A gas injection system includes a diffuser to distribute a process gas in a processing chamber. The gas injection system may be utilized in a polysilicon etching system involving corrosive process gases.