Beverly, MA, United States of America

Masaaki Hagihara


Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 48(Granted Patents)


Location History:

  • Beverly, MA (US) (2004 - 2010)
  • Peabody, MA (US) (2008 - 2010)

Company Filing History:


Years Active: 2004-2010

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8 patents (USPTO):Explore Patents

Title: Masaaki Hagihara: Innovator in Gas Injection Systems

Introduction

Masaaki Hagihara is a prominent inventor based in Beverly, MA (US). He has made significant contributions to the field of gas injection systems, holding a total of 8 patents. His work primarily focuses on enhancing processes in semiconductor manufacturing.

Latest Patents

Hagihara's latest patents include a "Reduced Contaminant Gas Injection System and Method of Using." This innovative gas injection system features a diffuser designed to distribute process gas effectively within a processing chamber. It is particularly useful in polysilicon etching systems that involve corrosive process gases. Another notable patent is the "Method and System for Etching a High-k Dielectric Material." This method describes a process for etching a high-k dielectric layer on a substrate within a plasma processing system. The process involves elevating the substrate temperature above 200°C, introducing a halogen-containing process gas, igniting a plasma, and exposing the substrate to this plasma. The inclusion of a reduction gas in the process gas enhances the etch rate of HfO compared to Si and SiO.

Career Highlights

Masaaki Hagihara is associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work has significantly impacted the efficiency and effectiveness of gas injection systems used in various manufacturing processes.

Collaborations

Hagihara has collaborated with notable professionals in his field, including Koichiro Inazawa and Vaidyanathan Balasubramaniam. These collaborations have further advanced the development of innovative technologies in semiconductor processing.

Conclusion

Masaaki Hagihara's contributions to gas injection systems and semiconductor manufacturing are noteworthy. His patents reflect a commitment to innovation and improvement in the industry. His work continues to influence the field, paving the way for future advancements.

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