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Sunnyvale, CA, United States of America

Aixtron, Inc.

USPTO Granted Patents = 21

Trademarks = 3

Forward Citations = 312

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39 inventors (with patents filed for the assignee):

Johannes Käppeler (5 out of 12 patents)

Carl Galewski (4 out of 11 patents)

Allan B Wiesnoski (4 out of 12 patents)

4. Peter Baumann (4 out of 6 patents)

5. Stephen E Savas (4 out of 60 patents)

6. Holger Jurgensen (4 out of 14 patents)

7. Sai Mantripragada (3 out of 11 patents)

8. Sooyun Joh (3 out of 13 patents)

9. Johannes Lindner (3 out of 5 patents)

10. Martin Dauelsberg (2 out of 10 patents)

11. Ana Rangelova Londergan (2 out of 7 patents)

12. Marcus Schumacher (2 out of 4 patents)

13. M Ziaul Karim (1 out of 27 patents)

14. Adam Boyd (1 out of 6 patents)

15. Olivier Feron (1 out of 2 patents)

21 patents: Sort by Forward Citations

1. 9359674 - Apparatus and method for dielectric deposition (2016-06-07),

2. 9299956 - Method for deposition of high-performance coatings and encapsulated electronic devices (2016-03-29),

3. 9096933 - Methods for plasma processing (2015-08-04),

4. 9096932 - Methods for plasma processing (2015-08-04),

5. 8986453 - Device for coating substrates disposed on a susceptor (2015-03-24),

6. 8906456 - Apparatus and method for high-throughput chemical vapor deposition (2014-12-09),

7. 8308867 - Device for the temperature control of the surface temperatures of substrates in a CVD reactor (2012-11-13),

8. 8304013 - Methods for depositing especially doped layers by means of OVPD or the like (2012-11-06),

9. 8298337 - Gas inlet element for a CVD reactor (2012-10-30),

10. 8157915 - CVD reactor having a process-chamber ceiling which can be lowered (2012-04-17),

11. 8152924 - CVD reactor comprising a gas inlet member (2012-04-10),

12. 8114480 - Method for self-limiting deposition of one or more monolayers (2012-02-14),

13. 8062426 - CVD reactor with RF-heated process chamber (2011-11-22),

14. 7981473 - Transient enhanced atomic layer deposition (2011-07-19),

15. 7981472 - Methods of providing uniform gas delivery to a reactor (2011-07-19),

Aixtron, Inc. is a leading provider of deposition equipment to the semiconductor industry. The company specializes in manufacturing innovative solutions for the production of advanced materials used in a variety of applications including LED, power electronics, and memory chips. With a global presence and a strong focus on research and development, Aixtron is committed to driving innovation in the semiconductor industry.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

21 Patents

#146 in Sunnyvale, CA

#3,615 in California

#15,151 in US

#29,031 in the World

Sunnyvale, CA, United States of America

Aixtron, Inc.

Forward Citations = 312

39 inventors:

Johannes Käppeler (5 out of 12 patents)

Carl Galewski (4 out of 11 patents)

Allan B Wiesnoski (4 out of 12 patents)

4. Peter Baumann (4 out of 6 patents)

5. Stephen E Savas (4 out of 60 patents)

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