For the Inventor, By the Inventor

Enter assignee name

Sunnyvale, CA, United States of America

Aixtron, Inc.

USPTO Granted Patents = 21

% Expired Patents = 23.8

Trademarks = 3

Forward Citations = 316

Loading Chart...

Loading Chart...

39 inventors (with patents filed for the assignee):

Johannes Käppeler (5 out of 12 patents)

Carl Galewski (4 out of 11 patents)

Allan B Wiesnoski (4 out of 12 patents)

4. Peter Baumann (4 out of 6 patents)

5. Stephen E Savas (4 out of 62 patents)

6. Holger Jurgensen (4 out of 14 patents)

7. Sai Mantripragada (3 out of 11 patents)

8. Sooyun Joh (3 out of 13 patents)

9. Johannes Lindner (3 out of 5 patents)

10. Martin Dauelsberg (2 out of 11 patents)

11. Ana Rangelova Londergan (2 out of 7 patents)

12. Marcus Schumacher (2 out of 4 patents)

13. M Ziaul Karim (1 out of 29 patents)

14. Adam Boyd (1 out of 6 patents)

15. Olivier Feron (1 out of 2 patents)

21 patents: Sort by Forward Citations

1. 9359674 - Apparatus and method for dielectric deposition (2016-06-07),

2. 9299956 - Method for deposition of high-performance coatings and encapsulated electronic devices (2016-03-29),

3. 9096933 - Methods for plasma processing (2015-08-04),

4. 9096932 - Methods for plasma processing (2015-08-04),

5. 8986453 - Device for coating substrates disposed on a susceptor (2015-03-24),

6. 8906456 - Apparatus and method for high-throughput chemical vapor deposition (2014-12-09),

7. 8308867 - Device for the temperature control of the surface temperatures of substrates in a CVD reactor (2012-11-13),

8. 8304013 - Methods for depositing especially doped layers by means of OVPD or the like (2012-11-06),

9. 8298337 - Gas inlet element for a CVD reactor (2012-10-30),

10. 8157915 - CVD reactor having a process-chamber ceiling which can be lowered (2012-04-17),

11. 8152924 - CVD reactor comprising a gas inlet member (2012-04-10),

12. 8114480 - Method for self-limiting deposition of one or more monolayers (2012-02-14),

13. 8062426 - CVD reactor with RF-heated process chamber (2011-11-22),

14. 7981473 - Transient enhanced atomic layer deposition (2011-07-19),

15. 7981472 - Methods of providing uniform gas delivery to a reactor (2011-07-19),

Aixtron, Inc. is a leading provider of deposition equipment for the semiconductor industry, specializing in the development and manufacturing of advanced materials for optoelectronics, power electronics, and microelectronics. The company focuses on innovative technologies that enable the production of high-performance devices, including LEDs, lasers, and solar cells. Headquartered in Sunnyvale, California, Aixtron serves a global market, contributing to advancements in various sectors through its cutting-edge solutions and expertise in molecular beam epitaxy and chemical vapor deposition.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

21 Patents

#181 in Sunnyvale, CA

#3,754 in California

#15,668 in US

#29,893 in the World

Sunnyvale, CA, United States of America

Aixtron, Inc.

Forward Citations = 316

39 inventors:

Johannes Käppeler (5 out of 12 patents)

Carl Galewski (4 out of 11 patents)

Allan B Wiesnoski (4 out of 12 patents)

4. Peter Baumann (4 out of 6 patents)

5. Stephen E Savas (4 out of 62 patents)

Please report any incorrect information to [email protected]

Loading…