The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2012

Filed:

Jun. 03, 2008
Applicants:

Walter Franken, Eschweiler, DE;

Johannes Käppeler, Würselen, DE;

Inventors:

Walter Franken, Eschweiler, DE;

Johannes Käppeler, Würselen, DE;

Assignee:

Aixtron Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/46 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a CVD reactor having a plurality of rotary tables () supported on a rotationally driven susceptor () on dynamic gas cushions (), wherein each gas cushion () is formed by an individually controlled gas flow and each gas flow, dependant on a surface temperature measured by a temperature measuring device (), can be varied by an individual actuator (). The invention further comprises a carrier (), carrying the susceptor () and rotating with the susceptor (). A common gas supply line () ending in the carrier () is key to the invention and provides the actuators () arranged on the carrier () with the gas that forms the gas flow.


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