This inventor holds 12 USPTO granted patents and 2 published patent applications and 18 EPO patents. Top assignees: Aixtron Ag, Aixtron, Inc., Aixtron Se. Active years: 2005-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Wurselen, DE (2006 - 2007)
- Würselen, DE (2005 - 2016)
Company Filing History:
Years Active: 2005-2016
Title: **Innovator Spotlight: Johannes Käppeler**
Introduction
Johannes Käppeler is a notable inventor based in Würselen, Germany, recognized for his significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of ten patents to his name, Käppeler has made strides in advancing the efficiency and functionality of CVD reactors and coating devices.
Latest Patents
Käppeler's latest patents showcase his innovative designs in substrate processing. One of his key inventions is a **CVD reactor** featuring a substrate holder that rests on a gas cushion. This novel design incorporates a plurality of gas inlet lines directed into the bearing surface, forming a multi-zonal gas cushion that supports the substrate holder. Additionally, different gases with distinct heat conduction properties can be efficiently utilized in separate zones. Another patent emphasizes a **device for coating substrates** with a two-part cup-shaped susceptor that facilitates the innovative heating of substrates through controlled heat conduction barriers. These inventions highlight Käppeler’s adeptness at blending mechanical engineering with semiconductor technology.
Career Highlights
Throughout his career, Käppeler has held positions in reputable companies such as Aixtron Inc. and Aixtron AG. His work has been crucial in setting new benchmarks for performance and reliability in semiconductor manufacturing equipment. The scope of his patents reflects a deep understanding of the complexities involved in CVD processes, pushing forward the capabilities of modern applications.
Collaborations
Käppeler has collaborated with notable industry professionals, including Holger Jürgensen and Gerhard Karl Strauch. These partnerships have enabled the exchange of ideas and expertise, further fueling innovation in the semiconductor sector.
Conclusion
Johannes Käppeler stands out as an inventive force in the realm of CVD technology. His array of patents not only underscores his creative prowess but also contributes valuable advancements to the semiconductor industry. As he continues to innovate, his work will likely inspire future developments in substrate processing technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile