The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2011

Filed:

Dec. 12, 2005
Applicants:

Johannes Käppeler, Würselen, DE;

Frank Wischmeyer, Melle, DE;

Inventors:

Johannes Käppeler, Würselen, DE;

Frank Wischmeyer, Melle, DE;

Assignee:

Aixtron Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention concerns a deposition device in particular of crystalline coatings on at least one substrate in particular crystalline. Said device comprises a treatment chamber () consisting of a number of wall elements (), said wall elements () being electroconductive and placed end-to-end, thus forming contacts (″); a reactor housing () enclosing the wall elements () of the treatment chamber and made of a non-electroconductive material and a RF-heated coil surrounding the wall elements () of the treatment chamber. The invention is characterized in that a massive single-piece shield heating pipe () is implanted between the reactor housing () and the walls () of the treatment chamber. The material of said pipe is electroconductive so that it is heated by the eddy currents induced therein by the RF field generated by the RF coil and so that it absorbs considerably the RF field and heats the walls () of the treatment chamber.


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