Location History:
- Aachen, DE (2004 - 2006)
- Melle, DE (2011)
Company Filing History:
Years Active: 2004-2011
Title: Frank Wischmeyer: Innovator in CVD Reactor Technology
Introduction
Frank Wischmeyer is a notable inventor based in Aachen, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology, particularly in the design and functionality of reactors used for depositing crystalline layers on substrates. With a total of two patents to his name, Wischmeyer continues to push the boundaries of innovation in this specialized area.
Latest Patents
Wischmeyer's latest patents include a CVD reactor with graphite-foam insulation and a tubular susceptor. This invention relates to a device designed for depositing crystalline layers on substrates using reaction gases in a heated process chamber. The process chamber is formed by a multi-part graphite tube within a reactor housing, which features quartz walls. The reactor housing is enclosed by a high-frequency coil, and the space between the housing wall and the graphite tube is filled with a graphite foam sleeve. This design improves heat insulation, as the graphite foam sleeve is fully slit to accommodate thermal elongation during heating.
Another significant patent is the CVD reactor with a substrate holder that is rotatably driven and mounted by a gas stream. This device also comprises a process chamber within a reactor housing, where the floor includes a substrate holder that is driven by a gas flow from a feed pipe. The substrate holder is supported in a bearing cavity on a gas cushion, enhancing the technological design of the substrate holder in a linear cross-flowing process chamber.
Career Highlights
Frank Wischmeyer is associated with Aixtron AG, a company known for its advanced deposition equipment used in the semiconductor industry. His work at Aixtron has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of CVD processes.
Collaborations
Wischmeyer has collaborated with notable colleagues such as Rune Berge and Johannes Käppeler. These partnerships have contributed to the advancement of CVD technology and the successful development of his patented inventions.
Conclusion
Frank Wischmeyer stands out as a key figure in the field of CVD reactor technology. His innovative patents and contributions to Aixtron AG reflect his commitment to advancing the science of material deposition. His work continues to influence the industry and inspire future innovations.