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Herzogenrath, Germany

Aixtron Ag

USPTO Granted Patents = 39

EPO Patents = 7

Trademarks = 6

Forward Citations = 720

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41 inventors (with patents filed for the assignee):

Gerhard Karl Strauch (11 out of 15 patents)

Johannes Kaeppeler (10 out of 10 patents)

Holger Jürgensen (8 out of 8 patents)

4. Gerd Strauch (7 out of 7 patents)

5. Johannes Käppeler (6 out of 12 patents)

6. Martin Dauelsberg (5 out of 10 patents)

7. Holger Jurgensen (5 out of 14 patents)

8. Michael Heuken (4 out of 7 patents)

9. Holger Jürgensen (3 out of 3 patents)

10. Armin Dadgar (2 out of 15 patents)

11. Alois Krost (2 out of 9 patents)

12. Piotr Strzyzewski (2 out of 3 patents)

13. Rune Berge (2 out of 5 patents)

14. Markus Reinhold (2 out of 4 patents)

15. Marc Deschler (2 out of 3 patents)

39 patents: Sort by Forward Citations

1. 8685500 - Method for depositing a thin-film polymer in a low-pressure gas phase (2014-04-01),

2. 8152927 - CVD coating device (2012-04-10),

3. 8052796 - CVD reactor comprising a photodiode array (2011-11-08),

4. 7842135 - Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire (2010-11-30),

5. 7762208 - Loading and unloading apparatus for a coating device (2010-07-27),

6. 7709398 - Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned (2010-05-04),

7. 7625448 - Inlet system for an MOCVD reactor (2009-12-01),

8. 7524532 - Process for depositing thin layers on a substrate in a process chamber of adjustable height (2009-04-28),

9. 7473316 - Method of growing nitrogenous semiconductor crystal materials (2009-01-06),

10. 7410670 - Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unit (2008-08-12),

11. 7332038 - Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates (2008-02-19),

12. 7294207 - Gas-admission element for CVD processes, and device (2007-11-13),

13. 7282096 - Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereon (2007-10-16),

14. 7201942 - Coating method (2007-04-10),

15. 7147718 - Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates (2006-12-12),

Aixtron AG is a leading provider of deposition equipment to the semiconductor industry. With their focus on developing innovative technologies, Aixtron offers a wide range of solutions for the production of advanced semiconductor materials. Their expertise in epitaxy enables the production of high-performance electronic components used in various applications such as LEDs, power electronics, and photovoltaics.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

39 Patents

#2 in Herzogenrath

#1,325 in Germany

#16,944 in the World

Herzogenrath, Germany

Aixtron Ag

Forward Citations = 720

41 inventors:

Gerhard Karl Strauch (11 out of 15 patents)

Johannes Kaeppeler (10 out of 10 patents)

Holger Jürgensen (8 out of 8 patents)

4. Gerd Strauch (7 out of 7 patents)

5. Johannes Käppeler (6 out of 12 patents)

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