Aachen, Germany

Gerhard Karl Strauch

USPTO Granted Patents = 15 

 

Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 127(Granted Patents)


Location History:

  • Wohnsitz, DE (2013)
  • Aachen, DE (2005 - 2015)

Company Filing History:


Years Active: 2005-2015

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15 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Inventor Gerhard Karl Strauch

Introduction: Gerhard Karl Strauch is a prominent inventor located in Aachen, Germany, renowned for his significant contributions to the field of semiconductor layer deposition. With a remarkable total of 15 patents, Strauch has made substantial advancements in various techniques aimed at enhancing the efficiency and quality of semiconductor manufacturing processes.

Latest Patents: Strauch's latest inventions include innovative patents related to the chemical vapor deposition (CVD) method and CVD reactor. The first patent pertains to a device and method for depositing semiconductor layers on substrates via process gases introduced into the process chamber through a gas inlet organ. This invention ensures contamination-free layers are deposited sequentially, addressing challenges associated with intermediate cleaning and replacement procedures. His second patent details a method for equipping an epitaxy reactor, improving the apparatus to enable the reproducible deposition of thick multi-layer structures through direct process steps, while utilizing materials with optical properties that correspond to those of the deposited layers.

Career Highlights: Throughout his career, Gerhard Karl Strauch has been associated with esteemed companies such as Aixtron AG and Aixtron SE. His work in these organizations has enabled him to refine his ideas and push the boundaries of semiconductor technology, leading to the successful creation of numerous patents that contribute to the industry.

Collaborations: Strauch has collaborated with skilled colleagues, including Holger Jürgensen and Johannes Käppeler. These partnerships have allowed for the exchange of ideas and the development of innovative solutions within the field of semiconductor manufacturing.

Conclusion: Gerhard Karl Strauch exemplifies the spirit of innovation with his extensive portfolio of patents and his contributions to advancing semiconductor layer deposition technologies. His inventions continue to shape the industry, providing crucial advancements that enhance manufacturing processes and promote the development of high-quality semiconductor devices.

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