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Herzogenrath, Germany

Aixtron Se

USPTO Granted Patents = 71

EPO Patents = 64

Trademarks = 10

Forward Citations = 224

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120 inventors (with patents filed for the assignee):

Francisco Ruda Y Witt (9 out of 9 patents)

Michael Long (7 out of 7 patents)

Stephen E Savas (7 out of 61 patents)

4. Marcel Kollberg (6 out of 6 patents)

5. Adam Boyd (5 out of 6 patents)

6. Carl Galewski (5 out of 11 patents)

7. Peter Sebald Lauffer (5 out of 5 patents)

8. Wilhelm Josef Thomas Krücken (4 out of 4 patents)

9. Markus Gersdorff (4 out of 5 patents)

10. Kenneth B K Teo (4 out of 6 patents)

11. Alexandre Jouvray (4 out of 4 patents)

12. Hugo Silva (4 out of 4 patents)

13. Allan B Wiesnoski (4 out of 12 patents)

14. Oliver Schön (4 out of 5 patents)

15. Daniel Brien (3 out of 3 patents)

Core Competencies:

CVD Reactor

Carbon-Containing Structures

Temperature Control

Susceptor Arrangement

Vapor Concentration Determination

Epitaxial Deposition

Nanotube Deposition

Gas Inlet Element

Surface Temperature Measurement

Coating Device

Semiconductor Layer Deposition

Exhaust Gas Treatment

71 patents: Sort by Forward Citations

1. 12435422 - Method for recording a state of a CVD reactor under production conditions (2025-10-07),

2. 12398466 - Method for emissivity-corrected pyrometry (2025-08-26),

3. 12359319 - Arrangement for measuring the surface temperature of a susceptor in a CVD reactor (2025-07-15),

4. 12325912 - Apparatus and method for depositing carbon-containing structures (2025-06-10),

5. 12320002 - CVD reactor and method for controlling the surface temperature of the substrates (2025-06-03),

6. 12305282 - Susceptor of a CVD reactor (2025-05-20),

7. 12234553 - CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor (2025-02-25),

8. 12180590 - Cover plate for covering the susceptor side facing the process chamber of a device for depositing SiC layers (2024-12-31),

9. 12139793 - CVD device component provided with an individual identifier, and method for communicating information (2024-11-12),

10. 12110591 - Susceptor arrangement of a CVD reactor (2024-10-08),

11. 12098462 - Method for producing a component part of a CVD reactor (2024-09-24),

12. 12084768 - Method for using shield plate in a CVD reactor (2024-09-10),

13. 12084767 - Gas-inlet element for a CVD reactor (2024-09-10),

14. 12012654 - Device for coating a substrate with a carbon-containing coating (2024-06-18),

15. 11959190 - Device for connecting a susceptor to a drive shaft (2024-04-16),

AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry. Their solutions are used for the production of advanced components for applications such as LEDs, power electronics, and optoelectronics. AIXTRON's innovative technology enables the precise deposition of thin films, providing customers with high-performance and efficient manufacturing solutions.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

71 Patents

#1 in Herzogenrath

#815 in Germany

#10,076 in the World

Herzogenrath, Germany

Aixtron Se

Forward Citations = 224

120 inventors:

Francisco Ruda Y Witt (9 out of 9 patents)

Michael Long (7 out of 7 patents)

Stephen E Savas (7 out of 61 patents)

4. Marcel Kollberg (6 out of 6 patents)

5. Adam Boyd (5 out of 6 patents)

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