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For the Inventor, By the Inventor

Herzogenrath, Germany

Aixtron Se


USPTO Granted Patents = 78

% Expired Patents = 3.8


Trademarks = 9

Forward Citations = 235

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130 inventors (with patents filed for the assignee):

goldMedal Francisco Ruda Y Witt (9 out of 9 patents)

silverMedal Marcel Kollberg (7 out of 7 patents)

bronzeMedal Michael Long (7 out of 7 patents)

4.  Stephen E Savas (7 out of 62 patents)

5.  Peter Sebald Lauffer (7 out of 7 patents)

6.  Adam Boyd (5 out of 6 patents)

7.  Carl Galewski (5 out of 11 patents)

8.  Wilhelm Josef Thomas Krücken (4 out of 4 patents)

9.  Markus Gersdorff (4 out of 5 patents)

10.  Kenneth B K Teo (4 out of 6 patents)

11.  Alexandre Jouvray (4 out of 4 patents)

12.  Hugo Silva (4 out of 4 patents)

13.  Martin Dauelsberg (4 out of 11 patents)

14.  Allan B Wiesnoski (4 out of 12 patents)

15.  Oliver Schön (4 out of 5 patents)


Core Competencies:
Chemical Vapor Deposition
CVD Reactor
Substrate Temperature
Temperature Control
Surface Treatment
Nanostructures
Layer Deposition
Plasma Processing
Gas Distribution
Carbon Structures
Semiconductor Fabrication
Epitaxial Deposition

78 patents:

1. 12723309 - Method and device for depositing a layer containing a group five element in a process chamber and subsequent cleaning of the process chamber (2026-09-01),
2. 12692602 - Wall-cooled gas-inlet element for a CVD reactor (2026-07-28),
3. 12680166 - Gas inlet device for a CVD reactor (2026-07-14),
4. 12674234 - Method for ascertaining the end of a cleaning process for a process chamber of a MOCVD reactor (2026-07-07),
5. 12584222 - Methods for thermal treatment of substrates (2026-03-24),
6. 12577674 - Method for identifying substrates which are faulty or have been incorrectly inserted into a CVD reactor (2026-03-17),
7. 12577670 - CVD reactor having means for locally influencing the susceptor temperature (2026-03-17),
8. 12435422 - Method for recording a state of a CVD reactor under production conditions (2025-10-07),
9. 12398466 - Method for emissivity-corrected pyrometry (2025-08-26),
10. 12359319 - Arrangement for measuring the surface temperature of a susceptor in a CVD reactor (2025-07-15),
11. 12325912 - Apparatus and method for depositing carbon-containing structures (2025-06-10),
12. 12320002 - CVD reactor and method for controlling the surface temperature of the substrates (2025-06-03),
13. 12305282 - Susceptor of a CVD reactor (2025-05-20),
14. 12234553 - CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor (2025-02-25),
15. 12180590 - Cover plate for covering the susceptor side facing the process chamber of a device for depositing SiC layers (2024-12-31),
Aixtron SE, headquartered in Herzogenrath, Germany, specializes in the development and manufacturing of equipment for chemical vapor deposition (CVD) technology. The company focuses on advanced CVD reactors and related processes that enable the deposition of thin films and nanostructures on various substrates. Aixtron's innovations are pivotal in industries such as semiconductor manufacturing, optoelectronics, and nanotechnology, contributing to the advancement of materials science and surface treatment techniques.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Sep 29 2026

Aixtron Se
78 Patents

#1 in Herzogenrath

#738 in Germany

#9,661 in the World

Herzogenrath, DE
Herzogenrath, Germany

Aixtron Se

Forward Citations = 235

130 inventors:

goldMedal Francisco Ruda Y Witt (9 out of 9 patents)

silverMedal Marcel Kollberg (7 out of 7 patents)

bronzeMedal Michael Long (7 out of 7 patents)

4.  Stephen E Savas (7 out of 62 patents)

5.  Peter Sebald Lauffer (7 out of 7 patents)

Please report any incorrect information to [email protected]
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