Würselen, Germany

Marcel Kollberg

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Wurselen, DE (2021)
  • Würselen, DE (2021 - 2023)

Company Filing History:


Years Active: 2021-2024

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6 patents (USPTO):Explore Patents

Title: Marcel Kollberg: Innovator in CVD Reactor Technology

Introduction

Marcel Kollberg is a notable inventor based in Würselen, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology, holding a total of six patents. His work focuses on enhancing the efficiency and functionality of CVD reactors, which are essential in various industrial applications.

Latest Patents

Kollberg's latest patents include a "Susceptor arrangement of a CVD reactor" and a "Method for producing a component part of a CVD reactor." The susceptor arrangement features a circular or annular design that incorporates a substrate holder and multiple covering elements made from silicon carbide. This innovative design allows for improved thermal management and substrate processing. The method for producing a component part involves selective laser etching to create cavities within a quartz component, which can withstand high temperatures and contact with various chemical compounds.

Career Highlights

Marcel Kollberg is currently associated with Aixtron SE, a leading company in the field of CVD technology. His work at Aixtron has positioned him as a key player in advancing reactor designs and improving manufacturing processes. His patents reflect a deep understanding of the technical challenges faced in the industry and showcase his ability to develop practical solutions.

Collaborations

Kollberg has collaborated with notable colleagues such as Francisco Ruda Y Witt and Mike Pfisterer. These partnerships have likely contributed to the innovative advancements in CVD technology and have fostered a collaborative environment for research and development.

Conclusion

Marcel Kollberg's contributions to CVD reactor technology through his patents and work at Aixtron SE highlight his role as an influential inventor in the field. His innovative designs and methods continue to shape the future of chemical vapor deposition processes.

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