This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Aixtron Se. Active years: 2021-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021-2025
Title: **Wilhelm Josef Thomas Krücken: Innovator in CVD Reactor Technology**
Introduction
Wilhelm Josef Thomas Krücken is a prominent inventor based in Aachen, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) by developing innovative technologies that enhance the performance and efficiency of CVD reactors. With a total of three patents to his name, his work reflects a strong commitment to innovation in the industry.
Latest Patents
Among Krücken's latest patents is the "Method for using shield plate in a CVD reactor." This patent details a sophisticated design for a CVD reactor that includes a gas inlet member with a circular outline and a heated susceptor. A notable feature is the cooled ceiling panel equipped with outlet openings. The invention introduces a shield plate that adjoins the ceiling panel, designed to optimize gas flow within the reactor. The shield plate comprises a central zone and an annular zone, with a defined material thickness of 3 to 12 mm. It is spatially arranged from the ceiling panel, maintaining a gap height of 0.3 to 1 mm, which is critical for the reactor's efficient operation.
Another patent by Krücken focuses on a similar shield plate for a CVD reactor, reinforcing his dedication to enhancing reactor designs through multiple innovative approaches.
Career Highlights
Krücken is affiliated with Aixtron SE, a company renowned for its high-performance equipment for the semiconductor and optoelectronic industries. His tenure at Aixtron has allowed him to be at the forefront of CVD reactor technology development, providing solutions that address current industry challenges.
Collaborations
Throughout his career, Wilhelm has collaborated with several distinguished colleagues, including Adam Boyd and Honggen Jiang. Their collective expertise contributes to the innovative environment at Aixtron and fosters advancements in CVD technology.
Conclusion
Wilhelm Josef Thomas Krücken’s work in patents related to CVD reactors marks him as a significant figure in the field of engineering and innovation. His contributions not only enhance the performance of chemical vapor deposition but also reflect a broader commitment to advancing technological capabilities within the industry. As he continues to work alongside talented professionals, the future holds promising developments in CVD technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile