The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Jan. 05, 2021
Aixtron SE, Herzogenrath, DE;
Ralf Leiers, Mönchengladbach, DE;
AIXTRON SE, Herzogenrath, DE;
Abstract
In a CVD reactor and a method for the open-loop/closed-loop control of the surface temperature of substrates arranged therein, the substrates lie on substrate-retaining elements, which are each supported by a gas cushion. Actual values of the surface temperatures associated with a respective substrate-retaining element are successively measured and the surface temperatures are controlled in a closed-loop manner to a common value by varying the gas cushion height. After measuring each actual value of the surface temperature associated with a substrate-retaining element and using only the respective last-measured actual value of the surface temperatures of each substrate-retaining element, a first average value is calculated, a difference value associated with the substrate-retaining element is calculated, and an approximate actual value is calculated for each of the other substrate-retaining elements by adding the associated difference value to the first average value, said approximate actual value being used for the open-loop/closed-loop control.