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For the Inventor, By the Inventor

Eschweiler, Germany

Francisco Ruda Y Witt

This inventor holds 9 USPTO granted patents and 2 published patent applications and 2 EPO patents. Top assignee: Aixtron Se. Active years: 2016-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Francisco Ruda Y Witt. Retrieved from https://idiyas.com/inventor/francisco-ruda-y-witt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:

goldMedal9 out of 79 
 
Aixtron Se
 patents

Years Active: 2016-2025

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9 patents (USPTO):Explore Patents
1. 12359319 - Arrangement for measuring the surface temperature of a susceptor in a CVD reactor (2025-07-15),
2. 12110591 - Susceptor arrangement of a CVD reactor (2024-10-08),
3. 12098462 - Method for producing a component part of a CVD reactor (2024-09-24),
4. 11959190 - Device for connecting a susceptor to a drive shaft (2024-04-16),
5. 11702740 - Closure element for closing a loading opening of an inner housing of a CVD reactor (2023-07-18),
6. 11441223 - Susceptor for a CVD reactor (2022-09-13),
7. 11286566 - Apparatus for deposition of a III-V semiconductor layer (2022-03-29),
8. 10883171 - CVD reactor and method for cleaning a CVD reactor (2021-01-05),
9. 9447500 - CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones (2016-09-20),

Title: Francisco Ruda Y Witt: Innovator in CVD Reactor Technology

Introduction

Francisco Ruda Y Witt is a notable inventor based in Eschweiler, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology, holding a total of nine patents. His work focuses on improving the efficiency and effectiveness of CVD reactors, which are essential in various industrial applications.

Latest Patents

Among his latest patents is an innovative arrangement for measuring the surface temperature of a susceptor in a CVD reactor. This invention features a cover plate with a circumferential edge that extends along a circular arc line. Additionally, multiple identically configured cover plates can be arranged in a circle, allowing their outer edges to complement each other and form a complete circle. The design includes storage spaces for substrates or substrate holders, with openings that enable optical temperature measurement through the cover plate. Another significant patent is the susceptor arrangement for use in a CVD reactor, which includes a circular or annular susceptor with a substrate holder and covering elements. The covering plates, preferably made from silicon carbide, are connected by positioning elements, enhancing the functionality of the reactor.

Career Highlights

Francisco Ruda Y Witt is currently associated with Aixtron SE, a leading company in the field of CVD technology. His work at Aixtron has been instrumental in advancing the capabilities of CVD reactors, making them

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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