The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Oct. 08, 2010
Francisco Ruda Y Witt, Eschweiler, DE;
Johannes Käppeler, Würselen, DE;
Francisco Ruda Y Witt, Eschweiler, DE;
Johannes Käppeler, Würselen, DE;
Aixtron SE, Herzogenrath, DE;
Abstract
The invention relates to a CVD reactor having a process chamber () and a substrate holder support () arranged therein, said support comprising at least one bearing surface (), wherein a plurality of gas inlet lines () open out into the bearing surface ('). The CVD reactor further has a substrate holder (), the back side thereof facing the bearing surface (′), wherein the gases fed through the gas inlet lines () into the space between the bearing surface (′) and back side form a gas cushion () supporting the substrate holder (). According to the invention, the gas cushion comprises a plurality of zones (A, C) that each can be fed through an associated gas inlet line () and that are separated from each other by a means () preventing gas exchange between the zones (A, C). At least one inner zone (C) is associated with a gas discharge line (), via which the gas fed into the inner zone (C) by way of the inlet line () can be discharged. Gases having different heat conduction properties are fed into the zones.