The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jan. 05, 2006
Applicants:
Markus Reinhold, Hilden, DE;
Peter Baumann, Aachen, DE;
Gerhard Karl Strauch, Aachen, DE;
Inventors:
Assignee:
Aixtron, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a gas inlet element () for a CVD reactor with a chamber (), which has a multitude of bottom-side outlet openings (), via which a process gas introduced into the chamber () via edge-side access openings () exits into a process chamber () of the CVD reactor (). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement () is situated upstream from the access openings (), and at least two process gases are mixed with one another inside this mixing chamber arrangement.