Location History:
- Würselen, DE (2005 - 2007)
- Wuerselen, DE (2009 - 2012)
Company Filing History:
Years Active: 2005-2012
Title: The Innovative Contributions of Johannes Kaeppeler
Introduction
Johannes Kaeppeler is a prolific inventor based in Wuerselen, Germany, recognized for his significant contributions to the field of semiconductor technology. With a total of 10 patents to his name, Kaeppeler has made remarkable advancements that enhance the processes of layer deposition on crystalline substrates.
Latest Patents
Among his latest inventions are two significant patents focused on chemical vapor deposition (CVD) technologies. The first, a "CVD coating device," presents a method for depositing crystalline layers using reaction gases. This invention features a support plate that allows for a variable gap height to influence surface temperatures, thereby optimizing the layer deposition process.
The second patent, a "CVD reactor comprising a photodiode array," outlines a device that facilitates the deposition of crystalline layers on substrates. This invention incorporates a gas-admittance body opposite the substrate holder, equipped with evenly distributed outlets for process gases. Notably, this reactor enhances temperature observation with sensors aligned with the gas outlets, improving the overall monitoring and quality of the deposition process.
Career Highlights
Kaeppeler's work is primarily associated with Aixtron AG, a leader in the development of equipment for the production of advanced semiconductor materials. His inventions are crucial for the advancement of technologies related to thin-film deposition.
Collaborations
Throughout his career, Kaeppeler has collaborated with esteemed colleagues, including Gerhard Karl Strauch and Martin Dauelsberg. Together, they have contributed to the innovative landscape of semiconductor manufacturing, pushing the boundaries of existing technologies.
Conclusion
Johannes Kaeppeler stands out as a vital contributor to semiconductor technology, with his patents paving the way for advanced manufacturing processes. His innovative approaches not only enhance current methodologies but also inspire future developments in the field.