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Air Water Inc.

USPTO Granted Patents = 46

% Expired Patents = 15.2

EPO Patents = 21

Trademarks = 2

Forward Citations = 117

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84 inventors (with patents filed for the assignee):

Keisuke Kawamura (9 out of 9 patents)

Sumito Ouchi (6 out of 6 patents)

Naoto Yoshinaga (6 out of 6 patents)

4. Satoshi Ibaraki (6 out of 9 patents)

5. Mitsuhisa Narukawa (5 out of 5 patents)

6. Hidehiko Oku (5 out of 5 patents)

7. Ichiro Hide (5 out of 5 patents)

8. Yoshinobu Kodani (5 out of 5 patents)

9. Takaomi Ikeda (5 out of 5 patents)

10. Yoshiharu Wakayama (5 out of 5 patents)

11. Yoshimi Murage (5 out of 5 patents)

12. Takashi Yokoyama (4 out of 4 patents)

13. Jun Shimomura (4 out of 4 patents)

14. Niro Shiomi (4 out of 7 patents)

15. Hiroki Suzuki (3 out of 3 patents)

Core Competencies:

Compound Semiconductor

Silicon Oxide Film

Substrate Processing

Hydrogen Generator

Nitride Semiconductor

Thermal Expandability

Gas Barrier Film

Cryogenic Pump

Phenol Resin

Liquid Fluid Supply

Angiogenesis Regulation

Selective Adsorbent

46 patents: Sort by Forward Citations

1. 12751033 - Compound semiconductor substrate and compound semiconductor device comprising a Si substrate a SiC layer, nitride semiconductor layers, an electronic traveling layer, and a barrier layer (2026-09-29),

2. 12703914 - Method for forming silicon oxide film (2026-08-11),

3. 12571094 - Method of processing substrate, substrate processing apparatus, and recording medium (2026-03-10),

4. 12490486 - Compound semiconductor substrate and method for manufacturing compound semiconductor substrate (2025-12-02),

5. 12230679 - Compound semiconductor substrate including nitride semiconductor layer having varying threading dislocation densities (2025-02-18),

6. 12129973 - Liquefied fluid supply system and liquefied fluid-spraying apparatus (2024-10-29),

7. 12087852 - Compound semiconductor device, compound semiconductor substrate, and method for manufacturing compound semiconductor device (2024-09-10),

8. 12001136 - Pellicle intermediary body, pellicle, method for manufacturing of pellicle intermediary body, and pellicle manufacturing method (2024-06-04),

9. 11626283 - Compound semiconductor substrate, a pellicle film, and a method for manufacturing a compound semiconductor substrate (2023-04-11),

10. 11485635 - Hydrogen generator (2022-11-01),

11. 11476115 - Compound semiconductor substrate comprising a SiC layer (2022-10-18),

12. 11316018 - Compound semiconductor substrate including electron transition layer and barrier layer (2022-04-26),

13. 11231647 - Pellicle and method for manufacturing pellicle (2022-01-25),

14. 11119402 - Method for manufacturing of pellicle (2021-09-14),

15. 10563307 - Method for manufacturing substrate (2020-02-18),

Air Water Inc., headquartered in Sapporo, Japan, specializes in advanced technologies related to compound semiconductors and liquefied fluid systems. The company focuses on the development and manufacturing of innovative solutions such as nitride semiconductor layers, hydrogen generators, and single crystal SiC substrates. Additionally, Air Water is involved in creating gas barrier films and cryogenic pumps, contributing to various industries by enhancing the efficiency and performance of semiconductor applications and fluid supply systems.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

46 Patents

#2 in Sapporo

#1,800 in Japan

#15,085 in the World

Air Water Inc.

Forward Citations = 117

84 inventors:

Keisuke Kawamura (9 out of 9 patents)

Sumito Ouchi (6 out of 6 patents)

Naoto Yoshinaga (6 out of 6 patents)

4. Satoshi Ibaraki (6 out of 9 patents)

5. Mitsuhisa Narukawa (5 out of 5 patents)

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