Ichiro Hide

Title: Ichiro Hide: Innovator in Semiconductor Technology

Introduction

Ichiro Hide is a prominent inventor based in Nagano, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on the development of pellicles and methods for manufacturing semiconductor substrates.

Latest Patents

Ichiro Hide's latest patents include innovations such as the pellicle intermediary body, pellicle, method for manufacturing a pellicle intermediary body, and pellicle manufacturing method. These patents provide a pellicle intermediary body that consists of a silicon substrate, a silicon oxide film on its surface, and a silicon layer atop the oxide film. Notably, the silicon layer features a low Crystal Originated Particle (COP) portion, which reduces the number of COPs as it approaches the surface. Additionally, he has developed a method for manufacturing a compound semiconductor substrate that allows for the thinning of silicon carbide (SiC) film.

Career Highlights

Ichiro Hide is currently employed at Air Water Inc., where he continues to advance his research and development efforts in semiconductor technology. His innovative approaches have positioned him as a key figure in the industry.

Collaborations

Ichiro has collaborated with notable colleagues, including Hidehiko Oku and Kei Mihara, to further enhance the impact of his inventions.

Conclusion

Ichiro Hide's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in manufacturing processes and materials.