The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Sep. 27, 2023
Applicants:
Air Water Inc., Osaka, JP;
Air Water Performance Chemical Inc., Kanagawa, JP;
Inventors:
Assignees:
AIR WATER INC., Osaka, JP;
AIR WATER PERFORMANCE CHEMICAL INC., Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/401 (2013.01); C23C 16/4408 (2013.01);
Abstract
A method for forming a silicon oxide film, containing:
Nagata, Keisuke. (2026). Method for forming silicon oxide film (U.S. Patent No. 12703914). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12703914
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile