Hofu, Japan

Yoshiharu Wakayama


 

Average Co-Inventor Count = 7.1

ph-index = 3

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 2012-2013

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5 patents (USPTO):Explore Patents

Title: Yoshiharu Wakayama: Innovator in Semiconductor Materials

Introduction

Yoshiharu Wakayama, located in Hofu, Japan, is a notable inventor with a total of five patents to his name. His contributions to the field of semiconductor materials innovation have garnered attention in the industry, particularly for their potential applications in advanced technologies.

Latest Patents

Wakayama's latest patents include significant advancements such as a non-thermofusible phenol resin powder and the methods for producing it. This resin powder has an average particle diameter of no more than 20 μm and a single particle ratio of at least 0.7, making it particularly suitable as an organic filler for sealing materials and adhesives used in semiconductor applications. Furthermore, it is noteworthy that this phenol resin powder has a chlorine content of no more than 500 ppm, enhancing its utility in various applications. Besides sealing materials and adhesives for semiconductors, the resin powder also demonstrates promising uses as a precursor for functional carbon materials like molecular sieve carbon and carbon electrode materials.

Career Highlights

Wakayama is associated with Air Water Inc., a company that supports innovation and development in various sectors, including semiconductors. His work has played an essential role in enhancing the materials used within this industry, contributing to the advancement of manufacturing processes and product quality.

Collaborations

Throughout his career, Wakayama has collaborated with talented colleagues, including Naoto Yoshinaga and Satoshi Ibaraki. Their combined expertise and innovative spirit have led to the successful development of new materials that push the boundaries of semiconductor technology.

Conclusion

Yoshiharu Wakayama exemplifies the spirit of innovation through his contributions to the field of semiconductor materials. His ongoing work continues to inspire advancements in technology, underscoring the importance of research and development in creating high-performance materials for the future.

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