Matsumoto, Japan

Mitsuhisa Narukawa



Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Nagano, JP (2019)
  • Matsumoto, JP (2022)

Company Filing History:


Years Active: 2019-2025

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5 patents (USPTO):Explore Patents

Title: Mitsuhisa Narukawa: Innovator in Compound Semiconductor Technology

Introduction

Mitsuhisa Narukawa is a prominent inventor based in Matsumoto, Japan. He has made significant contributions to the field of compound semiconductors, holding a total of five patents. His work focuses on enhancing the performance and efficiency of semiconductor substrates.

Latest Patents

Narukawa's latest patents include innovative designs for compound semiconductor substrates. One notable patent describes a compound semiconductor substrate that includes a nitride semiconductor layer with varying threading dislocation densities. This substrate features a silicon base, a graded aluminum nitride layer, and a gallium nitride layer, all designed to optimize performance by reducing dislocation density. Another patent outlines a method for manufacturing a compound semiconductor substrate that incorporates a silicon carbide layer. This method involves multiple steps, including the formation of aluminum nitride layers at controlled temperatures to achieve desired material properties.

Career Highlights

Narukawa is currently employed at Air Water Inc., where he continues to advance semiconductor technology. His expertise in the field has positioned him as a key player in the development of innovative materials and processes that enhance semiconductor performance.

Collaborations

Throughout his career, Narukawa has collaborated with notable colleagues, including Keisuke Kawamura and Hiroki Suzuki. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Mitsuhisa Narukawa's contributions to compound semiconductor technology are noteworthy and impactful. His patents reflect a deep understanding of material science and engineering, paving the way for advancements in the semiconductor industry. His ongoing work at Air Water Inc. continues to influence the future of semiconductor applications.

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