Hidehiko Oku

Title: Innovations of Hidehiko Oku

Introduction

Hidehiko Oku is a prominent inventor based in Nagano, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on the development of pellicles and methods for manufacturing semiconductor substrates.

Latest Patents

Oku's latest patents include innovations such as the pellicle intermediary body, pellicle, method for manufacturing a pellicle intermediary body, and pellicle manufacturing method. These patents describe a pellicle intermediary body that consists of a silicon substrate, a silicon oxide film on its surface, and a silicon layer on top of the oxide film. The silicon layer features a low Crystal Originated Particle (COP) portion, which reduces the number of COPs as it approaches the surface. Additionally, he has developed a method for manufacturing a compound semiconductor substrate that allows for the thinning of silicon carbide (SiC) film.

Career Highlights

Hidehiko Oku is currently employed at Air Water Inc., where he continues to innovate in the semiconductor field. His work has been instrumental in advancing the technology used in various applications.

Collaborations

Oku collaborates with notable colleagues, including Ichiro Hide and Kei Mihara, who contribute to his research and development efforts.

Conclusion

Hidehiko Oku's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to shape the future of semiconductor manufacturing.