Location History:
- Fremont, CA (US) (2014)
- Boise, ID (US) (2012 - 2016)
Company Filing History:
12 out of 37,972 
2 out of 2,320 Years Active: 2012-2016
Title: Zishu Zhang: Innovator in Photolithography Technologies
Introduction
Zishu Zhang is a prominent inventor based in Boise, ID (US), known for his significant contributions to the field of photolithography. With a total of 14 patents to his name, Zhang has made remarkable advancements in imaging devices and semiconductor technologies.
Latest Patents
Zishu Zhang's latest patents include innovative methods and apparatuses for lens heating compensation in photolithography. One of his notable inventions involves a photolithographic apparatus that features an optical path designed to provide a first diffraction pattern and a second diffraction pattern to a portion of the optical system. This method allows for the imaging of semiconductor articles using the first diffraction pattern while the second diffraction pattern is not utilized for imaging. Additionally, he has developed imaging devices that comprise a first region and a second region, where imaging features and assist features are formed on pitch and are substantially the same size.
Career Highlights
Throughout his career, Zishu Zhang has worked with leading companies in the technology sector, including Micron Technology Incorporated and Nan Ya Technology Corporation. His work has significantly impacted the development of advanced semiconductor devices and imaging technologies.
Collaborations
Zishu Zhang has collaborated with notable professionals in his field, including Anton J deVillers and Dan B Millward. These collaborations have further enhanced his innovative contributions to photolithography and semiconductor technologies.
Conclusion
Zishu Zhang's work exemplifies the spirit of innovation in the field of photolithography. His patents and career achievements reflect his dedication to advancing technology and improving semiconductor manufacturing processes.