The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Aug. 24, 2010
Scott L. Light, Boise, ID (US);
Dan Millward, Boise, ID (US);
Yuan He, Boise, ID (US);
Kaveri Jain, Boise, ID (US);
Lijing Gou, Boise, ID (US);
Zishu Zhang, Boise, ID (US);
Anton Devilliers, Boise, ID (US);
Michael Hyatt, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Scott L. Light, Boise, ID (US);
Dan Millward, Boise, ID (US);
Yuan He, Boise, ID (US);
Kaveri Jain, Boise, ID (US);
Lijing Gou, Boise, ID (US);
Zishu Zhang, Boise, ID (US);
Anton deVilliers, Boise, ID (US);
Michael Hyatt, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imagable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imagable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imagable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication.