The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Jun. 13, 2011
Yuan He, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Scott L. Light, Boise, ID (US);
Anton Devilliers, Boise, ID (US);
Kaveri Jain, Boise, ID (US);
Zishu Zhang, Boise, ID (US);
Dan Millward, Boise, ID (US);
Yuan He, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Scott L. Light, Boise, ID (US);
Anton deVilliers, Boise, ID (US);
Kaveri Jain, Boise, ID (US);
Zishu Zhang, Boise, ID (US);
Dan Millward, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Some embodiments include system and methods to obtain information for adjusting variations in features formed on a substrate of a semiconductor device. Such methods can include determining a first pupil in an illumination system used to form a first feature, and determining a second pupil used to form a second feature. The methods can also include determining a pupil portion belonging to only one of the pupils, and generating a modified pupil portion from the pupil portion. Information associated with the modified pupil portion can be obtained for controlling a portion of a projection lens assembly of an illumination system. Other embodiments are described.