The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Aug. 08, 2011
Scott L. Light, Boise, ID (US);
Kaveri Jain, Boise, ID (US);
Zishu Zhang, Boise, ID (US);
Anton J Devilliers, Boise, ID (US);
Dan Millward, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Michael D. Hyatt, Boise, ID (US);
Scott L. Light, Boise, ID (US);
Kaveri Jain, Boise, ID (US);
Zishu Zhang, Boise, ID (US);
Anton J deVilliers, Boise, ID (US);
Dan Millward, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Michael D. Hyatt, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of processing a substrate includes forming first photoresist on a substrate. A portion of the first photoresist is selectively exposed to actinic energy and then the first photoresist is negative tone developed to remove an unexposed portion of the first photoresist. Second photoresist is formed on the substrate over the developed first photoresist. A portion of the second photoresist is selectively exposed to actinic energy and then the second photoresist is negative tone developed to remove an unexposed portion of the second photoresist and form a pattern on the substrate which comprises the developed first photoresist and the developed second photoresist. Other implementations are disclosed.