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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Zhihong Wang

USPTO Granted Patents = 18 

Average Co-Inventor Count = 5.7

ph-index = 4

Forward Citations = 44(Granted Patents)


Company Filing History:

goldMedal18 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2009-2020

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18 patents (USPTO):
1. 10741459 - Inductive monitoring of conductive loops (2020-08-11),
2. 10589397 - Endpoint control of multiple substrate zones of varying thickness in chemical mechanical polishing (2020-03-17),
3. 10464184 - Modifying substrate thickness profiles (2019-11-05),
4. 10199281 - Substrate features for inductive monitoring of conductive trench depth (2019-02-05),
5. 10103073 - Inductive monitoring of conductive trench depth (2018-10-16),
6. 9911664 - Substrate features for inductive monitoring of conductive trench depth (2018-03-06),
7. 9754846 - Inductive monitoring of conductive trench depth (2017-09-05),
8. 9296084 - Polishing control using weighting with default sequence (2016-03-29),
9. 9248544 - Endpoint detection during polishing using integrated differential intensity (2016-02-02),
10. 9067295 - Monitoring retaining ring thickness and pressure control (2015-06-30),
11. 9005999 - Temperature control of chemical mechanical polishing (2015-04-14),
12. 8860932 - Detection of layer clearing using spectral monitoring (2014-10-14),
13. 8755928 - Automatic selection of reference spectra library (2014-06-17),
14. 8694144 - Endpoint control of multiple substrates of varying thickness on the same platen in chemical mechanical polishing (2014-04-08),
15. 7699972 - Method and apparatus for evaluating polishing pad conditioning (2010-04-20),

Title: Innovations of Zhihong Wang in Integrated Circuit Fabrication

Introduction

Zhihong Wang is a prominent inventor based in Santa Clara, California. He has made significant contributions to the field of integrated circuit fabrication, holding a total of 18 patents. His work focuses on enhancing the efficiency and precision of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is titled "Inductive Monitoring of Conductive Loops." This invention involves the fabrication of an integrated circuit that includes a layer with multiple conductive interconnects. The process utilizes an inductive monitoring system to track the depth of conductive material in a trench, generating a signal that reflects changes over time. Another notable patent is "Endpoint Control of Multiple Substrate Zones of Varying Thickness in Chemical Mechanical Polishing." This innovation determines the required polish time for different substrates and optimizes the pressure applied during the polishing operation to ensure uniformity and efficiency.

Career Highlights

Zhihong Wang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His expertise in integrated circuit technology has positioned him as a key figure in advancing manufacturing techniques.

Collaborations

He has collaborated with notable coworkers, including Wen-Chiang Tu and Jimin Zhang, contributing to various projects that enhance semiconductor fabrication processes.

Conclusion

Zhihong Wang's innovative patents and contributions to integrated circuit fabrication demonstrate his significant impact on the semiconductor industry. His work continues to influence advancements in technology and manufacturing efficiency.

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