The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Jul. 18, 2012
Jimin Zhang, San Jose, CA (US);
Harry Q. Lee, Lost Altos, CA (US);
Zhihong Wang, Santa Clara, CA (US);
Wen-chiang Tu, Mountain View, CA (US);
Jimin Zhang, San Jose, CA (US);
Harry Q. Lee, Lost Altos, CA (US);
Zhihong Wang, Santa Clara, CA (US);
Wen-Chiang Tu, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.