Tainan, Taiwan

Ze-Ming Wu

USPTO Granted Patents = 13 

Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 455(Granted Patents)


Location History:

  • Tainan, TW (2013 - 2017)
  • Hsinchu, TW (2020 - 2024)

Company Filing History:


Years Active: 2013-2025

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13 patents (USPTO):

Title: The Inventor Spotlight: Ze-Ming Wu

Introduction: Ze-Ming Wu, a prolific inventor from Tainan, Taiwan, is making waves in the world of semiconductor technology with his innovative patents and cutting-edge solutions.

Latest Patents:

1. Method of manufacturing semiconductor device and system for same: Ze-Ming Wu's method revolutionizes the storage and reuse of PC descriptions of layout cells, streamlining the process by leveraging predefined cells and PC descriptions stored in a database, ultimately enhancing efficiency and reducing the need for repetitive calculations.

2. Integrated circuit layout generation method and system: Wu's approach to generating a netlist of an IC device simplifies the process by incorporating gate region information, determining gate resistance values, and modifying the netlist accordingly, showcasing his expertise in integrated circuit design.

Career Highlights: With an impressive portfolio of 10 patents under his belt, Ze-Ming Wu has established himself as a key player in the semiconductor industry. He is currently contributing his talents to Taiwan Semiconductor Manufacturing Company Ltd., a prominent player in the global semiconductor market.

Collaborations: Wu thrives in collaborative environments, working alongside accomplished colleagues like Ke-Ying Su and Hsiao-Shu Chao. Together, they harness their collective expertise to push the boundaries of semiconductor innovation and drive technological advancements.

Conclusion: Ze-Ming Wu's dedication to innovation, coupled with his pioneering spirit and collaborative approach, positions him as a standout inventor in the field of semiconductor technology. His contributions are not only shaping the present but also laying the foundation for future advancements in the industry.

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