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For the Inventor, By the Inventor

Taipei, Taiwan

Yung-Sung Yen

This inventor holds 82 USPTO granted patents and 7 published patent applications, primarily in Semiconductor Fabrication (CPC class H01L21-31144). Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yung-Sung Yen. Retrieved from https://idiyas.com/inventor/yung-sung-yen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 82 

% Patents Active = 81.7

Average Co-Inventor Count = 5.2

ph-index = 8

Forward Citations = 210(Granted Patents)

Forward Citations (Not Self Cited) = 164(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Jhonghe, TW (2007)
  • Taipei County, TW (2008 - 2018)
  • Taipei, TW (2019)
  • Taiwan, CN (2021)
  • New Taipei, CN (2022)
  • Hsin-Chu, TW (2011 - 2024)
  • New Taipei, TW (2016 - 2024)

Company Filing History:

goldMedal82 out of 42,926 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2007-2026

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Areas of Expertise:
Semiconductor Device
Trench Distortions
Directional Deposition
Lithography Monitoring
Pattern Fidelity
Fine Line Patterning
Self Aligned Litho Etch
Manufacturing Process
Process Margins
High Performance
Power Strap Structure
Directional Processing
82 patents (USPTO):Explore Patents
1. 12622235 - Method of manufacturing semiconductor device (2026-05-05),
2. 12394633 - Method of fabricating semiconductor device with reduced trench distortions (2025-08-19),
3. 12334342 - Pattern fidelity enhancement (2025-06-17),
4. 12266539 - Method of manufacturing semiconductor devices (2025-04-01),
5. 12230507 - Method of manufacturing semiconductor devices using directional process (2025-02-18),
6. 12153350 - Method of manufacturing semiconductor devices (2024-11-26),
7. 12148653 - Method of manufacturing semiconductor devices (2024-11-19),
8. 12085867 - Lithography process monitoring method (2024-09-10),
9. 12062543 - Line-end extension method and device (2024-08-13),
10. 12014926 - Self aligned litho etch process patterning method (2024-06-18),
11. 11955338 - Directional deposition for semiconductor fabrication (2024-04-09),
12. 11894238 - Method of fabricating semiconductor device with reduced trench distortions (2024-02-06),
13. 11862465 - Fine line patterning methods (2024-01-02),
14. 11854996 - Method for fabricating semiconductor device (2023-12-26),
15. 11854807 - Line-end extension method and device (2023-12-26),

Title: The Innovative Journey of Yung-Sung Yen

Introduction: Yung-Sung Yen, a pioneering inventor hailing from New Taipei, Taiwan, has made significant contributions to the world of technology and innovation.

Latest Patents: Yung-Sung Yen holds several patents in the field of electronics and semiconductor technology, with his most recent patent focusing on advanced nanotechnology applications in consumer electronics.

Career Highlights: Yung-Sung Yen's career is marked by a series of groundbreaking inventions that have revolutionized the industry. From his early days as a research scientist to his current role as a leading innovator, Yen has consistently pushed the boundaries of what is possible in the world of technology.

Collaborations: Throughout his career, Yung-Sung Yen has collaborated with top research institutions, leading companies, and brilliant minds in the field. His collaborative efforts have resulted in the development of cutting-edge technologies that have shaped the industry.

Conclusion: Yung-Sung Yen's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventions. His work continues to inspire future generations of inventors and researchers to push the limits of what is possible in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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