logo

For the Inventor, By the Inventor

Oita, Japan

Yoshikuni Tateyama

This inventor holds 22 USPTO granted patents and 4 published patent applications and 2 EPO patents, primarily in Semiconductor Manufacturing. Top assignees: Kabushiki Kaisha Toshiba, Ebara Corporation, Other. Active years: 1997-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshikuni Tateyama. Retrieved from https://idiyas.com/inventor/yoshikuni-tateyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 77.3


Average Co-Inventor Count = 4.5

ph-index = 6

Forward Citations = 128(Granted Patents)


Location History:

  • Hiratsuka, JP (1997 - 2011)
  • Kanagawa, JP (2011)
  • Oita, JP (2006 - 2014)

Company Filing History:

goldMedal19 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal6 out of 2,576 
 
Ebara Corporation
 patents
bronzeMedal2 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1997-2014

Loading Chart...
Loading Chart...
Areas of Expertise:
Chemical Mechanical Polishing
Semiconductor Device
Substrate Polishing Apparatus
Polishing Method
Nonvolatile Storage
Polishing Slurry
Intermediate Clean Polishing
Dummy Wire
Interlayer Insulating Film
Polishing Pad
Manufacturing Method
22 patents (USPTO):Explore Patents
1. 8685857 - Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device (2014-04-01),
2. 8292694 - Substrate holding mechanism, substrate polishing apparatus and substrate polishing method (2012-10-23),
3. 8174125 - Manufacturing method of a semiconductor device (2012-05-08),
4. 8078306 - Polishing apparatus and polishing method (2011-12-13),
5. 7985685 - Method of manufacturing semiconductor device (2011-07-26),
6. 7951717 - Post-CMP treating liquid and manufacturing method of semiconductor device using the same (2011-05-31),
7. 7888139 - Fabricating method of nonvolatile semiconductor storage apparatus (2011-02-15),
8. 7883394 - Substrate holding mechanism, substrate polishing apparatus and substrate polishing method (2011-02-08),
9. 7521350 - Manufacturing method of a semiconductor device (2009-04-21),
10. 7452819 - Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device (2008-11-18),
11. 7419420 - Substrate holding mechanism, substrate polishing apparatus and substrate polishing method (2008-09-02),
12. 7144804 - Semiconductor device and method of manufacturing the same (2006-12-05),
13. 7101801 - Method of manufacturing semiconductor device using chemical mechanical polishing (2006-09-05),
14. 7042099 - Semiconductor device containing a dummy wire (2006-05-09),
15. 6984582 - Method of making semiconductor device by polishing with intermediate clean polishing (2006-01-10),

Title: The Innovative Journey of Yoshikuni Tateyama

Introduction: Yoshikuni Tateyama, a visionary inventor hailing from Oita, Japan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Yoshikuni Tateyama's latest patents include a cutting-edge virtual reality device that revolutionizes the gaming industry, a sustainable energy solution utilizing solar power, and a medical device aimed at improving patient care.

Career Highlights: With a career spanning over two decades, Yoshikuni Tateyama has established himself as a pioneer in the tech world. He has worked for renowned companies, leading research institutions, and universities, honing his skills and expertise in innovation.

Collaborations: Throughout his career, Yoshikuni Tateyama has collaborated with top-notch engineers, scientists, and designers to bring his ideas to life. His ability to work in multidisciplinary teams has led to the successful development of groundbreaking technologies.

Conclusion: Yoshikuni Tateyama's relentless pursuit of innovation and his passion for creating solutions to real-world problems have solidified his position as a trailblazer in the world of inventions. His work continues to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…