The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Dec. 10, 2003
Dai Fukushima, Sagamihara, JP;
Gaku Minamihaba, Yokohama, JP;
Hiroyuki Yano, Yokohama, JP;
Yoshikuni Tateyama, Oita, JP;
Dai Fukushima, Sagamihara, JP;
Gaku Minamihaba, Yokohama, JP;
Hiroyuki Yano, Yokohama, JP;
Yoshikuni Tateyama, Oita, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A polishing method comprises supplying a polishing liquid to an upper portion of a film to be polished to carry out first polishing, the film being provided on a layer having a groove with a predetermined pattern so as to be filled therewith, after the first polishing, polishing the film to carry out clean polishing while supplying one of distilled water and a cleaning liquid thereto, and after the clean polishing, polishing a residual portion of the film remaining outside of the groove by supplying a polishing liquid to carry out second polishing.