The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Aug. 27, 2009
Yukiteru Matsui, Kanagawa, JP;
Takeo Kubota, Kanagawa, JP;
Yoshikuni Tateyama, Kanagawa, JP;
Hiroyuki Kanaya, Kanagawa, JP;
Yoshihiro Minami, Tokyo, JP;
Yukiteru Matsui, Kanagawa, JP;
Takeo Kubota, Kanagawa, JP;
Yoshikuni Tateyama, Kanagawa, JP;
Hiroyuki Kanaya, Kanagawa, JP;
Yoshihiro Minami, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A first electrode film, a ferroelectric film, and a second electrode film are accumulated above a semiconductor in this order, a hard mask is accumulated above the second electrode, scrub cleaning is performed on the surface of the hard mask with an surfactant, the hard mask on which the scrub cleaning is performed has been patterned according to a planar shape of a ferroelectric capacitor, and etching is performed by using as a hard mask the hard mask that has been patterned.