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For the Inventor, By the Inventor

San Jose, CA, United States of America

Yongmei Chen

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.7

ph-index = 5

Forward Citations = 116(Granted Patents)


Company Filing History:

goldMedal12 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2012-2025

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12 patents (USPTO):
1. 12249489 - Optical device improvement (2025-03-11),
2. 10957590 - Method for forming a layer (2021-03-23),
3. 10927449 - Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment (2021-02-23),
4. 10643895 - Self-aligned interconnects formed using subtractive techniques (2020-05-05),
5. 9865464 - Nanocrystalline diamond carbon film for 3D NAND hardmask application (2018-01-09),
6. 9761489 - Self-aligned interconnects formed using substractive techniques (2017-09-12),
7. 9695503 - High power impulse magnetron sputtering process to achieve a high density high SP3 containing layer (2017-07-04),
8. 9502262 - Nanocrystalline diamond carbon film for 3D NAND hardmask application (2016-11-22),
9. 9412613 - Development of high etch selective hardmask material by ion implantation into amorphous carbon films (2016-08-09),
10. 9382625 - Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition (2016-07-05),
11. 8293460 - Double exposure patterning with carbonaceous hardmask (2012-10-23),
12. 8148269 - Boron nitride and boron-nitride derived materials deposition method (2012-04-03),

Title: Innovations of Yongmei Chen

Introduction

Yongmei Chen is a prominent inventor based in San Jose, California, known for her significant contributions to the field of optical devices and integrated circuits. With a total of 12 patents to her name, she has made remarkable advancements in technology that enhance the performance and efficiency of optical devices.

Latest Patents

One of her latest patents focuses on an improvement in optical devices. This patent describes a method of processing an optical device, which includes positioning the device on a substrate support within a process chamber. The optical device comprises a substrate and multiple structures formed over it, with each structure containing a bulk region made of silicon carbide and surface regions made of silicon oxycarbide. The method involves providing process gases to the chamber and generating plasma to reduce the carbon content of the surface regions by at least 50%.

Another notable patent pertains to the fabrication of integrated circuits. This method involves forming a mask used in lithography processes to pattern and create trenches. The mask is formed over a substrate with at least two distinct materials through a selective deposition process. The method enhances electrical paths by filling gaps between the mask edges and the substrate with either the same or different material.

Career Highlights

Yongmei Chen is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. Her work at Applied Materials has positioned her as a key player in the development of innovative technologies that drive the industry forward.

Collaborations

Throughout her career, Yongmei has collaborated with notable colleagues, including Ludovic Godet and Jun Xue. These collaborations have further enriched her research and development efforts, leading to groundbreaking advancements in her field.

Conclusion

Yongmei Chen's contributions to optical devices and integrated circuits exemplify her innovative spirit and dedication to advancing technology. Her patents reflect her expertise and commitment to improving the efficiency and performance of modern devices.

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